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Costas Grigoropoulos

Laser Technologies Group
Lawrence Berkeley National Laboratory
Etcheverry Hall
Berkeley CA 94720
Office Location: 024-6107
(510) 642-2525

This speaker was a visiting speaker who delivered a talk or talks on the date(s) shown at the links below. This speaker is not otherwise associated with Lawrence Berkeley National Laboratory, unless specifically identified as a Berkeley Lab staff member.

This publications database is an ongoing project, and not all Division publications are represented here yet.

Publications

2010

Barcelo, Steven J., Matthew Rogers, Costas P. Grigoropoulos, and Samuel S. Mao. "Hydrogen Storage property of sandwiched magnesium hydride naoparticle thin film." International Journal of Hydrogen Energy (2010).
Owens, Travis, Samuel S. Mao, Erin K. Canfield, Costas P. Grigoropoulos, Xianglei Mao, and Richard E. Russo. "Ultrafast thin-film laser-induced breakdown spectroscopy of doped oxides." Applied Optics 49 (2010): C67-C69.

2009

Rogers, Matthew, Steven J. Barcelo, Xiaobo Chen, Thomas J. Richardson, Vincent Berube, Gang Chen, Mildred S. Dresselhaus, Costas P. Grigoropoulos, and Samuel S. Mao. "Hydrogen Storage Characteristics of Nanograined Free-Standing Magnesium-Nickel Films." Applied Physics A 96, no. 2 (2009): 349-352.

1996

Xu, X., Costas P. Grigoropoulos, and Richard E. Russo. "Nanosecond time resolved thermal emission measurements during pulse excimer laser interaction with materials." Applied Physics A-Materials Science & Processing 62 (1996): 51-59.

1995

Xu, X., Costas P. Grigoropoulos, and Richard E. Russo. "Heat transfer in excimer laser melting of thin polysilicon layers." Journal of Heat Transfer 117 (1995): 708-715.
Xu, X., Costas P. Grigoropoulos, and Richard E. Russo. "Transient temperature measurement during pulsed excimer laser heating of thin semiconductor films." Journal of Heat and Mass Transfer 117 (1995): 17-24.

1994

Xu, X., Costas P. Grigoropoulos, and Richard E. Russo. "Measurement of solid/liquid interface temperature during pulsed excimer laser malting of polycrystalline silicon films." Appl.Phys.Lett. 65 (1994): 1745-1747.